污水處理設(shè)備 污泥處理設(shè)備 水處理過濾器 軟化水設(shè)備/除鹽設(shè)備 純凈水設(shè)備 消毒設(shè)備|加藥設(shè)備 供水/儲(chǔ)水/集水/排水/輔助 水處理膜 過濾器濾芯 水處理濾料 水處理劑 水處理填料 其它水處理設(shè)備
上海巨納科技有限公司
參 考 價(jià) | 面議 |
產(chǎn)品型號(hào)
品 牌
廠商性質(zhì)其他
所 在 地上海
聯(lián)系方式:袁文軍查看聯(lián)系方式
更新時(shí)間:2024-02-15 13:21:03瀏覽次數(shù):61次
聯(lián)系我時(shí),請(qǐng)告知來自 環(huán)保在線暫無信息 |
簡(jiǎn)要描述:The only commercially available PTAS organic salt.
The only commercially available PTAS organic salt. This is the type of nucleation promoter actively used by our R&D team to product variety of large area 1cm2 to wafer scale CVD products. Examples include CVD MoS2, MoSe2, WS2, WSe2, ReS2, ReSe2, PtS2, PtSe2, SnS2, and SnSe2. Our CVD products require ~10mM (for Mo, W based TMDCs) to ~1mM concentration of PTAS for (Pt, Re, and Sn based TMDCs). The solution is intentionally packaged in 2mL bottle in liquid form at 2mM concentration to make ~200mL to 2L of solution. Thus, 2 mL bottle should be diluted to 200mL (using DI water) to grow CVD MoS2, MoSe2, WS2, and WSe2 monolayers.
To date our PTAS materials have enabled many researchers to synthesize 2D CVD materials. Ideal for Vapor transport growth for monolayer metal sulfides (MoS2, WS2, NiS2, TiS2, and etc.). Perylene-3,4,9,10-tetracarboxylic acid tetrapotassium acid salt (PTAS) acts as a seed for monolayer metal sulfides by catalyzing reduced metal oxides onto various substrates. This polymer has been synthesized at our facilities from perylene-3,4,9,10-tetracarboxylic dianhydride (PTC-DA) and the final product has been purified and filtered x7 times to reach 99.997% purity. We recommend our customers to treat their substrates using Piranha solution and / or plasma treatment cleaning process to prepare surfaces for PTAS functionalization prior to CVD growth.
Partial List of Publications Using This Product
Berkeley - M. Zhao et.al. "Large-scale chemical assembly of atomically thin transistors" Nature Nanotechnology 11, 954–959 (2016)
Y. Lee et.al. "Characterization of the structural defects in CVD-grown monolayered MoS2 using near-field photoluminescence imaging" Nanoscale, 2015,7, 11909-11914 DOI: 10.1039/C5NR02897C
您感興趣的產(chǎn)品PRODUCTS YOU ARE INTERESTED IN
環(huán)保在線 設(shè)計(jì)制作,未經(jīng)允許翻錄必究 .? ? ?
請(qǐng)輸入賬號(hào)
請(qǐng)輸入密碼
請(qǐng)輸驗(yàn)證碼
請(qǐng)輸入你感興趣的產(chǎn)品
請(qǐng)簡(jiǎn)單描述您的需求
請(qǐng)選擇省份
聯(lián)系方式
上海巨納科技有限公司